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Substrate Size

4”,6”,8”

Power Source

DC(Metal),

DC Pulse or RF (Composite Mat.)

Power Supply

DC : 1 kW, RF : 13.56 MHz / 600W

Gun

3ea, 4” Target

Heating

R.T ~ 300 C

Process chamber base pressure

<8.0 * 10-7 Torr

Process Gas

Ar, O2, N2

Operation S/W

GUI on MS Win.