Process Results : Al2O3 PEALD > ALD (PEALD) | ㈜제이하라

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T : 031-695-7875
F : 031-695-7877

ALD (PEALD)

Process Results : Al2O3 PEALD

페이지 정보

본문

• Wafer Size : 8” Si 

• Wafer Non-Uniformity < 2%

Sample

Exp. condition

Thick Maps

Results

A

TMA 0.3초,

Ar purge 7초,

RF 1초


cbef07b42f0c75bab1bd74408a01eac3_1750733998_821.jpg

th : 12.4nm

NU% 1.99

n : 1.6774

B

TMA 0.7 s,

Ar purge 10s,

O2(2s) RF 1s,

100Cycles


Temp.=100c


cbef07b42f0c75bab1bd74408a01eac3_1750734051_9039.jpg

th : 22.2nm,

NU% 3.77

n : 1.8282
  f677aca6442f7e659a53663e36c63594_1752540917_4975.jpg