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Dry Etcher (RIE & ICP RIE)

JICP-2000

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JICP-2000

 

구분

내용

비고

제품의 구성

1PM+ 1L/L

-

Wafer size

4”,6”, 8”

-

Load Lock

Vacuum L/L, 1wf/Auto loading

Gas line

Ar, N2, SF4, C4F8, Cl2, N2, BCl3

MFC 7 ea+

3spares

Footprint

2200 X 900 X 1630(mm), or

1900X1000X1630(mm)

-

Source Power

12.56MHz, 1kW, 2kW, 3kW

-

Bias Power

13.56MHz, 600W

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Utility

PM Dry Pump (>1200l/min),

LL Pump (>300 l/min)

(Option)

*Process Results


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