JCCP-2000 > Dry Etcher (RIE & ICP RIE) | ㈜제이하라

Dry Etcher (RIE & ICP RIE)

JCCP-2000

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JCCP-2000

 

구분

내용

비고

제품의 구성

1PM+ 1L/L

 

Wafer size

4”,6”, 8”


Load Lock

Vacuum L/L, 1wf/Auto loading

 

Gas line

Ar, N2, CF4, C4F8, Cl2, N2, CHF3

MFC 7 ea+

3spares

Footprint

2200 X 900 X 1630(mm),

1900X1000X1630(mm)

 

Source Power

12.56MHz, >1000W

 

Bias Power

13.56MHz, 600W

 

Utility

PM Dry Pump (>1200l/min),

LL Pump (>300 l/min)

(Option)